Patent attributes
Disclosed is a method for detecting and/or growing particles, comprising controlling the surface area exposed to the saturator region by monitoring at least one of a depth of the working liquid on the saturator surface, the surface area exposed to the saturator region, or a volume of the working liquid on the saturator surface. Also disclosed is an apparatus or system for detecting and/or growing particles, comprising a fluidics system configured to control the surface area exposed to the saturator region by monitoring at least one of a depth of the working liquid on the saturator surface, the surface area exposed to the saturator region, or a volume of the working liquid on the saturator surface. Certain aspects do not employ one or more porous structures for vapor generation, nor a separate carrier fluid flow or inlet comprising a carrier fluid and vaporized working liquid for combining with the sample flow in the saturator region.