US Patent 12133319 Apparatus and method for generating extreme ultraviolet radiation
Patent 12133319 was granted and assigned to Taiwan Semiconductor Manufacturing Company on October, 2024 by the United States Patent and Trademark Office.
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US Patent 12133319 Apparatus and method for generating extreme ultraviolet radiation
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Patent abstract
An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. A deformable mirror is disposed in a path of the excitation laser. A controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.
Infobox
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chun-Lin Chang0
Han-Lung Chang0
Li-Jui Chen0
Ting-Ya Cheng0
Date of Patent
October 29, 2024
0Patent Application Number
175628190
Date Filed
December 27, 2021
0Patent Citations
0
Patent Primary Examiner
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