Is a
Patent attributes
Patent Applicant
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
Matti Putkonen0
Antti Niskanen0
Jaakko Niinistō0
Markku Leskelä0
Mikko Ritala0
Petri Räisänen0
Date of Patent
February 22, 2005
0Patent Application Number
100676340
Date Filed
February 4, 2002
0Patent Citations Received
0
Patent Primary Examiner
Patent abstract
The present invention concerns a process for depositing rare earth oxide thin films, especially yttrium, lanthanum and gadolinium oxide thin films by an ALD process, according to which invention the source chemicals are cyclopentadienyl compounds of rare earth metals, especially those of yttrium, lanthanum and gadolinium. Suitable deposition temperatures for yttrium oxide are between 200 and 400° C. when the deposition pressure is between 1 and 50 mbar. Most suitable deposition temperatures for lanthanum oxide are between 160 and 165° C. when the deposition pressure is between 1 and 50 mbar.
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