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US Patent 12002657 Multi-layer plasma resistant coating by atomic layer deposition

Patent 12002657 was granted and assigned to Applied Materials on June, 2024 by the United States Patent and Trademark Office.

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Patent abstract

Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of an article using an atomic layer deposition (ALD) process. The plasma resistant coating has a first layer and a second layer including a solid solution of Y

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