Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 1, 2008
Patent Application Number
10917906
Date Filed
August 13, 2004
Patent Citations Received
0
Patent Primary Examiner
Patent abstract
This invention concerns a process for producing oxide thin film on a substrate by an ALD type process. According to the process, alternating vapour-phase pulses of at least one metal source material, and at least one oxygen source material are fed into a reaction space and contacted with the substrate. According to the invention, an yttrium source material and a zirconium source material are alternately used as the metal source material so as to form an yttrium-stabilised zirconium oxide (YSZ) thin film on a substrate.
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