US Patent 6875271 Simultaneous cyclical deposition in different processing regions
Patent 6875271 was granted and assigned to Applied Materials on April, 2005 by the United States Patent and Trademark Office.
All edits
Edits on 1 Feb, 2024
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
Edits on 19 Oct, 2023
Golden AI
Edits made to:
Infobox (+11 properties)
Article (+572 characters)
Article
Patent abstract
A method for simultaneous deposition of multiple compounds on a substrate is provided. In one aspect, a gas stream is introduced into a processing chamber and flows across a substrate surface disposed therein. The gas stream includes at least one dose of a first compound and at least one dose of a second compound. The doses of the first and second compounds are separated by a time delay, and the at least one dose of the first compound and the at least one dose of the second compound are simultaneously in fluid communication with the substrate surface.
Infobox
Is a
Patent Applicant
0
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Donald J. Verplancken0
W. Benjamin Glenn0
Date of Patent
April 5, 2005
0Patent Application Number
101188630
Date Filed
April 9, 2002
0Patent Primary Examiner
Golden AI
Edits made to:
US Patent 6875271 Simultaneous cyclical deposition in different processing regions
Find more entities like US Patent 6875271 Simultaneous cyclical deposition in different processing regions
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
