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US Patent 6878216 Substrate processing method and substrate processing system

Patent 6878216 was granted and assigned to Tokyo Electron on April, 2005 by the United States Patent and Trademark Office.

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Patent abstract

The present invention controls a temperature of a processing liquid to be in within an allowable processing temperature range, whereby the processing efficiency and throughputs can be improved, deterioration of the processing liquid is prevented, and the life of the processing liquid can be extended.

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