US Patent 6878216 Substrate processing method and substrate processing system
Patent 6878216 was granted and assigned to Tokyo Electron on April, 2005 by the United States Patent and Trademark Office.
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Patent abstract
The present invention controls a temperature of a processing liquid to be in within an allowable processing temperature range, whereby the processing efficiency and throughputs can be improved, deterioration of the processing liquid is prevented, and the life of the processing liquid can be extended.
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Patent Inventor Names
Sadayuki Fujishima0
Date of Patent
April 12, 2005
0Patent Application Number
102325620
Date Filed
August 30, 2002
0Patent Primary Examiner
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US Patent 6878216 Substrate processing method and substrate processing system
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