US Patent 6885153 Plasma processing apparatus and method
Patent 6885153 was granted and assigned to Tokyo Electron on April, 2005 by the United States Patent and Trademark Office.
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Patent abstract
A method for determining the potential of a plasma in a processing chamber includes determining voltages of respective plasma engaging surfaces of at least two plasma generating electrodes disposed within the processing chamber and determining the plasma potential by comparing the determined voltages and equating the highest determined voltage to the plasma potential.
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Patent Inventor Names
Bill H Quon0
Date of Patent
April 26, 2005
0Patent Application Number
107214130
Date Filed
November 26, 2003
0Patent Primary Examiner
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US Patent 6885153 Plasma processing apparatus and method
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