US Patent 6891152 Nano-lithography using squeezed atomic and molecular states

A method and apparatus for performing atomic and molecular nano-deposition by means of atomic or molecular focusing through a plurality of optical standing waves. A stacked set of standing light waves, preferably arranged as gratings in a predetermined form and of predetermined intensities, is used to sequentially compress or squeeze the width of the incident atomic or molecular beam into ultra-narrow, spatially localized spots or lines. The result is a focused beam of particles with improved resolution compared with prior art atomic focusing. Furthermore, spherical and chromatic aberrational effects can be reduced.