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US Patent 6952253 Lithographic apparatus and device manufacturing method

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Aleksey Kolesnychenko0

Alexander Straaijer0

Antonius Theodorus Anna Maria Derksen0

Bob Streefkerk0

Christiaan Alexander Hoogendam0

Erik Roelof Loopstra0

Helmar Van Santen0

Joannes Theodoor De Smit0

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Date of Patent

October 4, 2005

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Patent Application Number

107057830

Date Filed

November 12, 2003

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Patent Citations Received

US Patent 12130558 Radiation system for controlling bursts of pulses of radiation

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US Patent 12066764 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

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US Patent 12072636 Fluid handling system and lithographic apparatus

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Patent Primary Examiner

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Patent abstract

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

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