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US Patent 6952253 Lithographic apparatus and device manufacturing method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
November 12, 2003
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Date of Patent
October 4, 2005
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Patent Application Number
10705783
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Patent Citations Received
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US Patent 12130558 Radiation system for controlling bursts of pulses of radiation
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US Patent 12066764 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
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US Patent 12072636 Fluid handling system and lithographic apparatus
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US Patent 12086973 Detection apparatus for simultaneous acquisition of multiple diverse images of an object
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US Patent 12094738 Systems for integrated decomposition and scanning of a semiconducting wafer
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US Patent 12112260 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
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US Patent 12117736 Lithographic apparatus
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US Patent 12117734 Metrology method and device for determining a complex-valued field
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US Patent 12117739 Thermo-mechanical actuator
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US Patent 12124179 Method of wafer alignment using at resolution metrology on product features
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•••
Patent Inventor Names
Aleksey Kolesnychenko
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Alexander Straaijer
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Antonius Theodorus Anna Maria Derksen
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Bob Streefkerk
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Christiaan Alexander Hoogendam
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Erik Roelof Loopstra
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Helmar Van Santen
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Joannes Theodoor De Smit
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Joeri Lof
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Johannes Catharinus Hubertus Mulkens
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•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
6952253
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Patent Primary Examiner
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D. Rutledge
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