US Patent 6970233 System and method for custom-polarized photolithography illumination
Patent 6970233 was granted and assigned to Texas Instruments on November, 2005 by the United States Patent and Trademark Office.
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Patent abstract
In one embodiment, a system for custom-polarized photolithography illumination includes an illuminator operable to generate an illumination pattern of light, a polarizer unit operable to variably polarize the light, and a mask pattern defining photolithographic pattern features in two dimensions. The mask pattern is associated with a mask capable of transmitting at least a portion of the variably polarized light through the mask pattern.
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Patent Inventor Names
James W. Blatchford0
Date of Patent
November 29, 2005
0Patent Application Number
107269880
Date Filed
December 3, 2003
0Patent Primary Examiner
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US Patent 6970233 System and method for custom-polarized photolithography illumination
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