Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hidetoshi Nishiyama0
Hikaru Koyama0
Mari Nozoe0
Date of Patent
March 28, 2006
0Patent Application Number
110021240
Date Filed
December 3, 2004
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Inspection method and apparatus using a charged particle beam for the inspection of defects on an unfinished semiconductor wafer in the manufacturing process of a semiconductor device, a uniform charge across the wafer is attained by performing ultraviolet irradiation and voltage application to a charge control electrode in a coordinated manner.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.