US Patent 7019294 Inspection method and apparatus using charged particle beam
Patent 7019294 was granted and assigned to Hitachi on March, 2006 by the United States Patent and Trademark Office.
All edits
Edits on 30 Jan, 2024
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
Edits on 17 Nov, 2023
Golden AI
Edits made to:
Infobox (+11 properties)
Article (+362 characters)
Article
Patent abstract
Inspection method and apparatus using a charged particle beam for the inspection of defects on an unfinished semiconductor wafer in the manufacturing process of a semiconductor device, a uniform charge across the wafer is attained by performing ultraviolet irradiation and voltage application to a charge control electrode in a coordinated manner.
Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hidetoshi Nishiyama0
Hikaru Koyama0
Mari Nozoe0
Date of Patent
March 28, 2006
0Patent Application Number
110021240
Date Filed
December 3, 2004
0Patent Primary Examiner
Golden AI
Edits made to:
US Patent 7019294 Inspection method and apparatus using charged particle beam
Find more entities like US Patent 7019294 Inspection method and apparatus using charged particle beam
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
