Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jeroen Johannes Sophia Maria Mertens0
Joeri Lof0
Johannes Catharinus Hubertus Mulkens0
Sjoerd Nicolaas Lambertus Donders0
Timotheus Franciscus Sengers0
Erik Roelof Loopstra0
Alexander Straaijer0
Antonius Theodorus Anna Maria Derksen0
...
Date of Patent
July 11, 2006
0Patent Application Number
107057850
Date Filed
November 12, 2003
0Patent Citations Received
Patent Primary Examiner
Patent abstract
In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
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