Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Nicolaas Rudolf Kemper0
Marco Koert Stavenga0
Tijmen Wilfred Mathijs Gunther0
Michel Riepen0
Michael Christiaan Van Der Wekken0
Erik Henricus Egidius Catharina Eummelen0
Christian Gerardus Norbertus Hendricus Marie Cloin0
Nicolaas Ten Kate0
...
Date of Patent
August 27, 2024
0Patent Application Number
175319530
Date Filed
November 22, 2021
0Patent Citations
...
Patent Primary Examiner
Patent abstract
A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
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