Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Zhijian Lu0
Chieh-Yu Lin0
Date of Patent
August 15, 2006
0Patent Application Number
102482320
Date Filed
December 30, 2002
0Patent Primary Examiner
Patent abstract
A method of transferring a pattern onto a substrate, in the fabrication of ICs, is disclosed. The substrate is coated with a photoresist layer, wherein the photoresist layer is selectively exposed and developed, producing sidewalls that exhibit roughness. The roughness is smoothened out by coating the photoresist layer with a coating layer.
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