Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
In-Kyun Shin0
Myung-Ah Kang0
Date of Patent
September 5, 2006
Patent Application Number
10368368
Date Filed
February 20, 2003
Patent Primary Examiner
Patent abstract
A method of manufacturing an alternating phase shift mask can be carried out in a short amount of time. A 180° phase shift region is formed using a multi-step etching process, and then a 0° phase region is formed. Forming the phase shift regions in this sequence minimizes the number of rounds of photolithography that have to be carried out in the method.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.