US Patent 7100322 Method of manufacturing an alternating phase shift mask
Patent 7100322 was granted and assigned to Samsung on September, 2006 by the United States Patent and Trademark Office.
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Patent Inventor Names
In-Kyun Shin0
Myung-Ah Kang0
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Patent abstract
A method of manufacturing an alternating phase shift mask can be carried out in a short amount of time. A 180° phase shift region is formed using a multi-step etching process, and then a 0° phase region is formed. Forming the phase shift regions in this sequence minimizes the number of rounds of photolithography that have to be carried out in the method.
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US Patent 07100322 Method of manufacturing an alternating phase shift mask US Patent 7100322 Method of manufacturing an alternating phase shift mask
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Patent Number
07100322
Patent Number
7100322
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US Patent 07100322 Method of manufacturing an alternating phase shift mask
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Is a
Current assignee
Patent jurisdiction
Patent number
07100322
Date of patent
September 5, 2006
Patent application number
10368368
Date Filed
February 20, 2003
Patent primary examiner
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