Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Wesley LaRue0
Bahri Ozturk0
Guangxin Wang0
Harry Rosenberg0
Date of Patent
September 5, 2006
0Patent Application Number
112027430
Date Filed
August 12, 2005
0Patent Primary Examiner
Patent abstract
Described is a method for producing high purity tantalum, the high purity tantalum so produced and sputtering targets of high purity tantalum. The method involves purifying starting materials followed by subsequent refining into high purity tantalum.
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