Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 12, 2006
Patent Application Number
10498800
Date Filed
September 11, 2003
Patent Primary Examiner
Patent abstract
It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments.
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