US Patent 7103990 Rotary silicon wafer cleaning apparatus
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Patent abstract
It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments.
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US Patent 07103990 Rotary silicon wafer cleaning apparatus US Patent 7103990 Rotary silicon wafer cleaning apparatus
Infobox
Patent Number
0710399000
Patent Number
710399000
Edits on 26 Apr, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
071039900
Date of Patent
September 12, 2006
0Patent Application Number
104988000
Date Filed
September 11, 2003
0Official Website
Patent Primary Examiner
Edits on 27 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
071039900
Date of Patent
September 12, 2006
0Patent Application Number
104988000
Date Filed
September 11, 2003
0Official Website
Patent Primary Examiner
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US Patent 07103990 Rotary silicon wafer cleaning apparatus
Infobox
Is a
Patent jurisdiction
Patent number
07103990
Date of patent
September 12, 2006
Patent application number
10498800
Date Filed
September 11, 2003
Patent primary examiner
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