US Patent 7115344 Photomask and pattern forming method employing the same
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Patent abstract
A semitransparent phase shifting mask has, in the periphery of a pattern element area, a light shielding portion which is formed by a semitransparent phase shifting portion and a transparent portion with the optimal size combination. A pattern is formed employing the semitransparent phase shifting mask.
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US Patent 07115344 Photomask and pattern forming method employing the same US Patent 7115344 Photomask and pattern forming method employing the same
Infobox
Patent Number
0711534400
Patent Number
711534400
Edits on 29 Mar, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
071153440
Date of Patent
October 3, 2006
0Patent Application Number
107770600
Date Filed
February 13, 2004
0Official Website
Patent Primary Examiner
Edits on 27 Sep, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
071153440
Date of Patent
October 3, 2006
0Patent Application Number
107770600
Date Filed
February 13, 2004
0Official Website
Patent Primary Examiner
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US Patent 07115344 Photomask and pattern forming method employing the same
Infobox
Is a
Patent jurisdiction
Patent number
07115344
Date of patent
October 3, 2006
Patent application number
10777060
Date Filed
February 13, 2004
Patent primary examiner
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