Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Aschwin Lodewijk Hendricus Johannes Van Meer0
Jan Rein Miedema0
Joost Jeroen Ottens0
Koen Jacobus Johannes Maria Zaal0
Tjarko Adriaan Rudolf Van Empel0
Date of Patent
October 10, 2006
0Patent Application Number
109264020
Date Filed
August 26, 2004
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.
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