Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Christopher F. Lyons0
Jongwook Kye0
Carl P. Babcock0
Date of Patent
October 24, 2006
0Patent Application Number
107264130
Date Filed
December 3, 2003
0Patent Primary Examiner
Patent abstract
A method of making a device using a lithographic system having a lens from which an exposure pattern is emitted. A conforming immersion medium can be positioned between a photo resist layer and the lens. The photo resist layer, which can be disposed over a wafer, and the lens can be brought into intimate contact with the conforming immersion medium. The photo resist can then be exposed with the exposure pattern so that the exposure pattern traverses the conforming immersion medium.
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