Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chen-Chiu Hsue0
Ming-Jeng Huang0
Date of Patent
October 24, 2006
0Patent Application Number
109636590
Date Filed
October 14, 2004
0Patent Primary Examiner
Patent abstract
A method of fabrication of a photosensitive device is disclosed. A substrate with at least an insulator layer formed thereon is provided. The insulator layer comprises a plurality of photoreceiving regions, and a plurality of conductive patterns are formed thereon without covering the photoreceiving regions. A dielectric layer is formed on the insulator and the conductive patterns, and polished by CMP thereof. The dielectric layer comprises a first dielectric layer formed by PECVD and a second dielectric layer formed by HDPCVD.
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