Patent attributes
An exposure device that sequentially projects and repeatedly transfers a predetermined pattern formed on a reticule onto wafers via an optical projection system, the exposure device including a movement unit that positions a current shot region on a wafer in the focal position of the optical projection system, a detection unit that detects tilting on an exposure surface of the current shot region with respect to an image plane of the optical projection system, and a plurality of first piezoelectric elements that correct the tilting on the current shot region with respect to the optical axis, based upon the detection results of the detection unit, so that the exposure surface of the current shot region will substantially match the image plane.
