US Patent 7147794 Coating for forming a high definition aperture
All edits
Edits on 6 Sep, 2023
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Inventor Names
Paul J. Gasloli0
Edits on 31 Aug, 2023
Golden AI
Edits made to:
Article (+528 characters)
Article
Patent abstract
An optical thin film stack for a dark aperture is deposited using thermal ion-assisted deposition (“IAD”). The IAD provides an energetic deposition of chromium and chromium oxide that results in a dark mirror optical thin film stack with superior etch properties. Edge definition is improved, and the edge profile is controllable by the selection of IAD parameters. An in situ IAD cleaning process can be used to clean the substrate sufficiently so that an intermediate adhesion layer of chromium is not required.
Edits on 24 May, 2023
Golden AI
Edits made to:
Infobox (+1/-1 properties)
US Patent 07147794 Coating for forming a high definition aperture US Patent 7147794 Coating for forming a high definition aperture
Infobox
Patent Number
07147794
Patent Number
7147794
Edits on 21 May, 2023
Golden AI
Edits made to:
Infobox (-1 properties)
Infobox
Official Website
Edits on 8 Jun, 2022
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Website URL
Edits on 19 Nov, 2021
Golden AI
Edits made to:
Infobox (+7 properties)
US Patent 07147794 Coating for forming a high definition aperture
Infobox
Is a
Patent jurisdiction
Patent number
07147794
Date of patent
December 12, 2006
Patent application number
10930094
Date Filed
August 31, 2004
Patent primary examiner
Find more entities like US Patent 7147794 Coating for forming a high definition aperture
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
