US Patent 7148147 CMP composition containing organic nitro compounds
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Patent Inventor Names
John Grunwald0
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Patent abstract
A composition and process for the precision polishing of substrates such as semi-conductor chips is disclosed. The composition and process make use of soluble or insoluble organic nitro compounds as oxidizers and/or abrasive particles. Nitrogen containing reduction products of the foregoing organic nitro compounds may also be included.
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US Patent 07148147 CMP composition containing organic nitro compounds US Patent 7148147 CMP composition containing organic nitro compounds
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Patent Number
071481470
Patent Number
71481470
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Patent Jurisdiction
Patent Number
071481470
Date of Patent
December 12, 2006
0Patent Application Number
112435630
Date Filed
October 5, 2005
0Official Website
Patent Primary Examiner
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US Patent 07148147 CMP composition containing organic nitro compounds
Infobox
Is a
Patent jurisdiction
Patent number
07148147
Date of patent
December 12, 2006
Patent application number
11243563
Date Filed
October 5, 2005
Patent primary examiner
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