Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Willem Lock0
Antonius Johannes Van der Net0
Franciscus Johannes Herman Maria Teunissen0
Date of Patent
December 12, 2006
Patent Application Number
10659709
Date Filed
September 11, 2003
Patent Primary Examiner
Patent abstract
In a purge gas system for a lithographic apparatus, a rate of flow of purge gas to the system is reduced substantially once a contamination level has fallen below a threshold level. The control may be on the basis of a detected level of contamination or on the basis of a timetable.
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