US Patent 7148949 Lithographic apparatus and device manufacturing method
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Patent Inventor Names
Antonius Johannes Van der Net0
Franciscus Johannes Herman Maria Teunissen0
Willem Lock0
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Patent abstract
In a purge gas system for a lithographic apparatus, a rate of flow of purge gas to the system is reduced substantially once a contamination level has fallen below a threshold level. The control may be on the basis of a detected level of contamination or on the basis of a timetable.
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US Patent 07148949 Lithographic apparatus and device manufacturing method US Patent 7148949 Lithographic apparatus and device manufacturing method
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Patent Number
07148949
Patent Number
7148949
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US Patent 07148949 Lithographic apparatus and device manufacturing method
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Is a
Patent jurisdiction
Patent number
07148949
Date of patent
December 12, 2006
Patent application number
10659709
Date Filed
September 11, 2003
Patent primary examiner
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