US Patent 7149998 Lithography process modeling of asymmetric patterns
Patent 7149998 was granted and assigned to Synopsys on December, 2006 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
December 30, 2002
Date of Patent
December 12, 2006
Patent Application Number
10335513
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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