Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 19, 2006
Patent Application Number
10911412
Date Filed
August 4, 2004
Patent Primary Examiner
Patent abstract
The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates. Particular writing strategies are described. Aspects of the present invention are described in the claims, specification and drawings.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
