Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Manoocher Birang0
Boguslaw A. Swedek0
Jeffrey Drue David0
Date of Patent
December 26, 2006
Patent Application Number
10921485
Date Filed
August 18, 2004
Patent Citations Received
0
Patent Primary Examiner
Patent abstract
A chemical mechanical polishing apparatus and method can use an eddy current monitoring system and an optical monitoring system. Signals from the monitoring systems can be combined on an output line and extracted by a computer. The eddy current monitoring system or the optical monitoring system can be used to determine the substrate edge. A focusing optic can be used to improve the accuracy of the optical monitoring system in detecting the edge of the substrate.
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