Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 26, 2006
Patent Application Number
10964276
Date Filed
October 13, 2004
Patent Primary Examiner
Patent abstract
To provide a silica film-forming material having a low dielectric constant and giving a film of less undergoing change in aging, a coating solution for forming a silica film includes a hydrolysis product of a mixture comprising: a tetraalkoxysilane; and at least one of a monoalkyltrialkoxysilane and a dialkyldialkoxysilane, and an ammonium salt represented by formula (I):
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