US Patent 7153355 Coating solution for forming silica film
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Patent abstract
To provide a silica film-forming material having a low dielectric constant and giving a film of less undergoing change in aging, a coating solution for forming a silica film includes a hydrolysis product of a mixture comprising: a tetraalkoxysilane; and at least one of a monoalkyltrialkoxysilane and a dialkyldialkoxysilane, and an ammonium salt represented by formula (I):
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US Patent 07153355 Coating solution for forming silica film US Patent 7153355 Coating solution for forming silica film
Infobox
Patent Number
0715335500
Patent Number
715335500
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Official Website
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Infobox
Is a
Patent Jurisdiction
Patent Number
071533550
Date of Patent
December 26, 2006
0Patent Application Number
109642760
Date Filed
October 13, 2004
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
071533550
Date of Patent
December 26, 2006
0Patent Application Number
109642760
Date Filed
October 13, 2004
0Official Website
Patent Primary Examiner
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US Patent 07153355 Coating solution for forming silica film
Infobox
Is a
Patent jurisdiction
Patent number
07153355
Date of patent
December 26, 2006
Patent application number
10964276
Date Filed
October 13, 2004
Patent primary examiner
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