US Patent 7160482 Composition comprising an oxidizing and complexing compound

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Edits on 6 Sep, 2023

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edited on 6 Sep, 2023

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Patent Inventor Names

Albrecht Fester0

Bernd Kolbesen0

Oliver Doll0

Paul Mertens0

Rita Vos0

Edits on 31 Aug, 2023

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edited on 31 Aug, 2023

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Patent abstract

The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate

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edited on 20 May, 2023

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https://pdfpiw.uspto.gov/.piw?Docid=071604820

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Golden AI

edited on 20 May, 2023