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US Patent 7164961 Modified photolithography movement system

Patent 7164961 was granted and assigned to Disco Corporation on January, 2007 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 11842708 Display with localized brightness adjustment capabilities
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Patent Inventor Names
Akira Ishikawa0
Wenhui Mei0
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Patent abstract

A method and system is provided for moving a substrate relative to a pixel panel in a digital photolithography system. The method can be used for performing photolithography on a substrate, the substrate having a first portion with a first design resolution and a second portion with a second design resolution. The method includes scanning the first portion of the substrate, having the first design resolution, at a first speed and scanning the second portion of the substrate, having the second design resolution, at a second speed, different from the first.

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US Patent 07164961 Modified photolithography movement system US Patent 7164961 Modified photolithography movement system

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Patent Number
071649610
Patent Number
71649610
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=071649610
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Infobox
Is a
Patent
Patent
0
Current Assignee
Disco Corporation
Disco Corporation
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
071649610
Date of Patent
January 16, 2007
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Patent Application Number
100641560
Date Filed
June 14, 2002
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=071649610
Patent Primary Examiner
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Zoila Cabrera
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=07164961
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 US Patent 07164961 Modified photolithography movement system

Infobox
Is a
Patent
Patent
Current assignee
Disco Corporation
Disco Corporation
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
07164961
Date of patent
January 16, 2007
Patent application number
10064156
Date Filed
June 14, 2002
Patent primary examiner
‌
Zoila Cabrera

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