Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 30, 2007
Patent Application Number
11000386
Date Filed
November 30, 2004
Patent Primary Examiner
Patent abstract
A pattern control system for cooling a wafer prior to a photolithography exposure step. The pattern control system includes a wafer transfer pathway for transferring the wafer in a photolithography process and at least one cooling module provided along the wafer transfer pathway for cooling the wafer. Cooling of the wafers prevents thermal distortion of circuit pattern images formed in a photoresist layer on the wafer during a subsequent photolithography exposure process.
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