US Patent 7170578 Pattern control system
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Patent abstract
A pattern control system for cooling a wafer prior to a photolithography exposure step. The pattern control system includes a wafer transfer pathway for transferring the wafer in a photolithography process and at least one cooling module provided along the wafer transfer pathway for cooling the wafer. Cooling of the wafers prevents thermal distortion of circuit pattern images formed in a photoresist layer on the wafer during a subsequent photolithography exposure process.
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US Patent 07170578 Pattern control system US Patent 7170578 Pattern control system
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Patent Number
0717057800
Patent Number
717057800
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Official Website
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Infobox
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Patent Jurisdiction
Patent Number
071705780
Date of Patent
January 30, 2007
0Patent Application Number
110003860
Date Filed
November 30, 2004
0Official Website
Patent Primary Examiner
Edits on 26 Sep, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
071705780
Date of Patent
January 30, 2007
0Patent Application Number
110003860
Date Filed
November 30, 2004
0Official Website
Patent Primary Examiner
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US Patent 07170578 Pattern control system
Infobox
Is a
Patent jurisdiction
Patent number
07170578
Date of patent
January 30, 2007
Patent application number
11000386
Date Filed
November 30, 2004
Patent primary examiner
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