US Patent 7172841 Crystallization apparatus, crystallization method, and phase shift mask
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Patent Inventor Names
Masakiyo Matsumura0
Yoshinobu Kimura0
Yukio Taniguchi0
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Patent abstract
A phase shift mask is arranged before a laser device through a beam expander, a homogenizer and a mirror, and a processed substrate is set on an opposed surface of the phase shift mask with an image forming optical system therebetween. The processed substrate is held at a predetermined position by using a substrate chuck such as a vacuum chuck or an electrostatic chuck.
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US Patent 07172841 Crystallization apparatus, crystallization method, and phase shift mask US Patent 7172841 Crystallization apparatus, crystallization method, and phase shift mask
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Patent Number
071728410
Patent Number
71728410
Edits on 24 Apr, 2023
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Patent Jurisdiction
Patent Number
071728410
Date of Patent
February 6, 2007
0Patent Application Number
107342480
Date Filed
December 15, 2003
0Official Website
Patent Primary Examiner
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US Patent 07172841 Crystallization apparatus, crystallization method, and phase shift mask
Infobox
Is a
Patent jurisdiction
Patent number
07172841
Date of patent
February 6, 2007
Patent application number
10734248
Date Filed
December 15, 2003
Patent primary examiner
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