US Patent 7175802 Refurbishing spent sputtering targets
Patent 7175802 was granted and assigned to Heraeus on February, 2007 by the United States Patent and Trademark Office.
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Patent Inventor Names
Bernd Kunkel0
Michael Sandlin0
Wenjun Zhang0
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Patent abstract
Spent sputtering targets are refurbished by filling the depleted region of the target with new sputter material using a hot isostatic pressing or HIP'ing technique.
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Patent Citations Received
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Official Website
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US Patent 07175802 Refurbishing spent sputtering targets US Patent 7175802 Refurbishing spent sputtering targets
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Patent Number
071758020
Patent Number
71758020
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071758020
Date of Patent
February 13, 2007
0Patent Application Number
102439480
Date Filed
September 16, 2002
0Official Website
Patent Primary Examiner
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Website URL
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US Patent 07175802 Refurbishing spent sputtering targets
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07175802
Date of patent
February 13, 2007
Patent application number
10243948
Date Filed
September 16, 2002
Patent primary examiner
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