Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Akiteru Koh0
Takashi Tsuruta0
Takashi Enomoto0
Akitaka Shimizu0
Hiromi Oka0
Date of Patent
February 20, 2007
Patent Application Number
10482405
Date Filed
July 5, 2002
Patent Primary Examiner
Patent abstract
A dry etching method involves plasma etching an organic anti-reflecting coating film through a mask layer made of photoresist and having a predetermined pattern by using an etching gas of CF4 and O2. The method allows an organic anti-reflecting coating film to be etched such that the etched film exhibits a side wall portion having a better shape as compared with that formed by a conventional technique.
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