Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Suzanne Coley0
Timothy G. Adams0
Zhibiao Mao0
Date of Patent
February 27, 2007
0Patent Application Number
099327920
Date Filed
August 17, 2001
0Patent Primary Examiner
Patent abstract
The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention have significantly increased oxygen content relative to prior compositions.
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