US Patent 7183037 Antireflective coatings with increased etch rates
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Patent Inventor Names
Suzanne Coley0
Timothy G. Adams0
Zhibiao Mao0
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Patent abstract
The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention have significantly increased oxygen content relative to prior compositions.
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US Patent 07183037 Antireflective coatings with increased etch rates US Patent 7183037 Antireflective coatings with increased etch rates
Infobox
Patent Number
071830370
Patent Number
71830370
Edits on 28 Apr, 2023
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Patent Jurisdiction
Patent Number
071830370
Date of Patent
February 27, 2007
0Patent Application Number
099327920
Date Filed
August 17, 2001
0Official Website
Patent Primary Examiner
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US Patent 07183037 Antireflective coatings with increased etch rates
Infobox
Is a
Patent jurisdiction
Patent number
07183037
Date of patent
February 27, 2007
Patent application number
09932792
Date Filed
August 17, 2001
Patent primary examiner
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