US Patent 7190434 Lithographic apparatus and device manufacturing method
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Patent Inventor Names
Arno Jan Bleeker0
Cheng-Qun Gui0
Joost Sytsma0
Pieter Willem Herman De Jager0
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Patent abstract
Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
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US Patent 07190434 Lithographic apparatus and device manufacturing method US Patent 7190434 Lithographic apparatus and device manufacturing method
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Patent Number
071904340
Patent Number
71904340
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Official Website
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Patent Jurisdiction
Patent Number
071904340
Date of Patent
March 13, 2007
0Patent Application Number
107798230
Date Filed
February 18, 2004
0Official Website
Patent Primary Examiner
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US Patent 07190434 Lithographic apparatus and device manufacturing method
Infobox
Is a
Patent jurisdiction
Patent number
07190434
Date of patent
March 13, 2007
Patent application number
10779823
Date Filed
February 18, 2004
Patent primary examiner
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