US Patent 7195716 Etching process and patterning process
Patent 7195716 was granted and assigned to United Microelectronics Corporation on March, 2007 by the United States Patent and Trademark Office.
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Patent abstract
An etching process is described. A material layer having a bottom anti-reflection coating (BARC) and a patterned photoresist layer thereon is provided. An etching step is performed to the BARC using the patterned photoresist layer as a mask. A cleaning step is performed to remove the polymer formed on the surface of the patterned photoresist layer. Thereafter, another etching step is performed to the material layer using the patterned photoresist layer as a mask.
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US Patent 07195716 Etching process and patterning process US Patent 7195716 Etching process and patterning process
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Patent Number
0719571600
Patent Number
719571600
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Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
071957160
Date of Patent
March 27, 2007
0Patent Application Number
107118380
Date Filed
October 8, 2004
0Official Website
Patent Primary Examiner
Edits on 26 Sep, 2022
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Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
071957160
Date of Patent
March 27, 2007
0Patent Application Number
107118380
Date Filed
October 8, 2004
0Official Website
Patent Primary Examiner
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US Patent 07195716 Etching process and patterning process
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07195716
Date of patent
March 27, 2007
Patent application number
10711838
Date Filed
October 8, 2004
Patent primary examiner
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