US Patent 7199028 Method for manufacturing semiconductor device
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Patent Inventor Names
Chang Jin Lee0
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Patent abstract
Provided is a method for manufacturing a semiconductor device capable of preventing a solution from penetrating a lower layer by forming a poly silicon layer stacked of the films having the different grain boundary structures at border, wherein the solution is used in the subsequent strip and cleaning process.
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US Patent 07199028 Method for manufacturing semiconductor device US Patent 7199028 Method for manufacturing semiconductor device
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Patent Number
07199028
Patent Number
7199028
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Official Website
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US Patent 07199028 Method for manufacturing semiconductor device
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Is a
Patent jurisdiction
Patent number
07199028
Date of patent
April 3, 2007
Patent application number
10739746
Date Filed
December 18, 2003
Patent primary examiner
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