Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 24, 2007
Patent Application Number
10738740
Date Filed
December 17, 2003
Patent Primary Examiner
Patent abstract
A method for plasma cleaning a CVD reactor chamber including providing a plasma enhanced CVD reactor chamber comprising residual deposited material; performing a first plasma process comprising an oxygen containing plasma; performing a second plasma process comprising an argon containing plasma; and, performing a third plasma process comprising a fluorine containing plasma.
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